Orthogonal Images Concealed Within a Responsive 6-Dimensional Hypersurface

Yerzhan S Zholdassov; Daniel J Valles; Samiha Uddin; Joanna Korpanty; Nathan C Gianneschi; Adam B Braunschweig

doi:10.1002/adma.202100803

Orthogonal Images Concealed Within a Responsive 6-Dimensional Hypersurface

Adv Mater. 2021 May;33(21):e2100803. doi: 10.1002/adma.202100803. Epub 2021 Apr 19.

Authors

Yerzhan S Zholdassov^{1

2

3}, Daniel J Valles^{1

2

3}, Samiha Uddin^{1

2}, Joanna Korpanty⁴, Nathan C Gianneschi^{4

5

6}, Adam B Braunschweig^{1

2

3}

Affiliations

¹ The Advanced Science Research Center at the Graduate Center of the City University of the New York, 85 St. Nicholas Terrace, New York, NY, 10031, USA.
² Department of Chemistry, Hunter College, 695 Park Avenue, New York, NY, 10065, USA.
³ The Ph.D. Program in Chemistry, Graduate Center of the City University of New York, 365 Fifth Avenue, New York, NY, 10016, USA.
⁴ Department of Chemistry, Northwestern University, Evanston, IL, 60208, USA.
⁵ Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
⁶ Department of Biomedical Engineering, Northwestern University, Evanston, IL, 60208, USA.

PMID: 33876463
DOI: 10.1002/adma.202100803

Abstract

A photochemical printer, equipped with a digital micromirror device (DMD), leads to the rapid elucidation of the kinetics of the surface-initiated atom-transfer radical photopolymerization of N,N-dimethylacrylamide (DMA) and N-isopropylacrylamide (NIPAM) monomers. This effort reveals conditions where polymer brushes of identical heights can be grown from each monomer. With these data, hidden images are created that appear upon heating the substrate above the lower critical solution temperature (LCST) of polyNIPAM. By introducing a third monomer, methacryloxyethyl thiocarbamoyl rhodamine B, a second, orthogonal image appears upon UV-irradiation. With these studies, it is shown how a new photochemical printer accelerates discovery, creates arbitrary patterns, and addresses long-standing problems in brush polymer and surface chemistry. With this technology in hand a new method is demonstrated to encrypt data within hypersurfaces.

Keywords: atom-transfer radical photopolymerization; hypersurfaces; photolithography; polymer brushes; stimuli-responsive systems.

Abstract

Grants and funding