A novel atomic layer method for encapsulating individual micro- and nano-particles with thin (sub-10-nm) dielectric films is presented. This method leverages the diffusion of vapor-phase precursors through an underlying inert polymer film to achieve growth of a metal oxide film on all sides of the particle simultaneously; even on the side that is in contact with the substrate. Crucially, the deposition is performed on stationary particles and does not require an agitation mechanism or a special reaction chamber. Here, conformal coatings of alumina are shown to improve stability in aqueous environments for two optically-relevant particles: compound semiconductor laser microparticles and lead halide perovskite nanocrystals.
Keywords: Atomic Layer Deposition; Nanoparticles; Perovskites; Semiconductor Lasers; Sequential Infiltration Synthesis; Vapor-Phase Infiltration.