Decomposition of naproxen by plasma in liquid process with TiO2 photocatslysts and hydrogen peroxide

Abstract

Naproxen (NPX), one of the representative non-steroidal anti-inflammatory drug (NSAID) ingredients, was decomposed by plasma in liquid process (PiLP). Strongly oxidized species generated in the plasma field of the PiLP, such as OH radicals, were confirmed by optical emission spectroscopy Increasing the operation parameters (pulse width, frequency and applied voltage) of the power supply promoted plasma field generation and OH radical generation, and affected the NPX decomposition rate. Although the NPX decomposition reaction rate was improved by up to 18-30% by adding TiO₂ photocatalyst powder and H₂O₂ to PiLP, but the optimal addition amount should be determined considering the plasma generation and scavenger effects. A decomposition pathway was proposed, in which NPX was mineralized into CO₂ and H₂O through five intermediates mainly by decarboxylation, demethylation, hydroxylation, and dehydration reactions via hydroxyl radicals.

Keywords: Hydrogen peroxide; Naproxen; OH radical; Plasma in liquid process; TiO(2) photocatalyst.