Fabrication of plasmonic nanostructures in a precise and reliable manner is a topic of huge interest because their structural details significantly affect their plasmonic properties. Herein, we present nanotip indentation lithography (NTIL) based on atomic force microscopy (AFM) indentation for the patterning of plasmonic nanostructures with precisely controlled size and shape. The size of the nanostructures is controlled by varying the indentation force of AFM tips into the mask polymer; while their shapes are determined to be nanodisks (NDs) or nanotriangles (NTs) depending on the shapes of the AFM tip apex. The localized surface plasmon resonance of the NDs is tailored to cover most of the visible-wavelength regime by controlling their size. The NTs show distinct polarization-dependent plasmon modes consistent with full-wave optical simulations. For the demonstration of the light-matter interaction control capability of NTIL nanostructures, we show that photoluminescence enhancement from MoS2 layers can be deliberately controlled by tuning the size of the nanostructures. Our results pave the way for the AFM-indentation-based fabrication of plasmonic nanostructures with a highly precise size and shape controllability and reproducibility.