In this paper we present a detailed evaluation of a micro-opto-electromechanical system (MOEMS) for active focusing which is realized using an electrostatically deformed thin silicon membrane. The evaluation is done using finite element methods and experimental characterization of the device behavior. The devices are realized in silicon on insulator technology. The influence of internal stress especially resulting from the high compressive buried oxide (BOX) layer is evaluated. Additionally, the effect of stress gradients in the crystalline device layer and of high reflective coatings such as aluminum is discussed. The influence of variations of some important process steps on the device performance is quantified. Finally, practical properties such as focal length control, long-term stability, hysteresis and dynamical response are presented and evaluated. The evaluation proves that the proposed membrane focusing device is suitable for high performance imaging (wavefront errors between λ/5-λ/10) with a large aperture (5 mm).
Keywords: FEM; MOEMS; SOI; active focusing; adaptive optics; electrostatic actuation; thin film stress.