Near-field engineering for boosting the photoelectrochemical activity to a modal strong coupling structure

Yanfeng Cao; Xu Shi; Tomoya Oshikiri; Shuai Zu; Yuji Sunaba; Keiji Sasaki; Hiroaki Misawa

doi:10.1039/d0cc07335k

Near-field engineering for boosting the photoelectrochemical activity to a modal strong coupling structure

Chem Commun (Camb). 2021 Jan 14;57(4):524-527. doi: 10.1039/d0cc07335k. Epub 2020 Dec 17.

Authors

Yanfeng Cao¹, Xu Shi, Tomoya Oshikiri, Shuai Zu, Yuji Sunaba, Keiji Sasaki, Hiroaki Misawa

Affiliation

¹ Research Institute for Electronic Science, Hokkaido University, Sapporo, Japan. misawa@es.hokudai.ac.jp.

PMID: 33332498
DOI: 10.1039/d0cc07335k

Abstract

Near-field engineering is considered a significant strategy in constructing plasmonic nanostructures for efficient plasmonic chemistry. We demonstrate interfacial near-field engineering on a Au-NP/TiO₂/Au-film (ATA) photoanode to improve the water oxidation efficiency. To tailor the near-field distribution, postdeposited Au on an ATA electrode (Au@ATA) is implemented using a facile constant potential electrolysis technique. As a result, the average photocurrent conversion efficiency of Au@ATA is approximately 1.3-fold higher than that of ATA.