Parasitic absorption and limited fill factor (FF) brought in by the use of amorphous silicon layers are efficiency-limiting challenges for the silicon heterojunction (SHJ) solar cells. In this work, postdeposition phosphorus (P) catalytic doping (Cat-doping) on intrinsic amorphous silicon (a-Si:H(i)) at a low substrate temperature was carried out and a P concentration of up to 6 × 1021 cm-3 was reached. The influences of filament temperature, substrate temperature, and processing pressure on the P profiles were systemically studied by secondary-ion mass spectrometry. By replacing the a-Si:H(n+er with P Cat-doping of an a-Si:H(i) layer, the passivation quality was improved, reaching an iVOC of 741 mV, while the parasitic absorption was reduced, leading to an increase in JSC by ∼1 mA/cm2. On the other hand, the open-circuit voltage and the FF of a conventional SHJ solar cell (with the a-Si:H(n) layer) can be improved by adding a Cat-doping process on the a-Si:H(i) layer, resulting in an increase in FF by 4.7%abs and in efficiency by 1.5%abs.
Keywords: Cat-CVD; hot wire chemical vapor deposition; intrinsic amorphous silicon; postdeposition; silicon heterojunction solar cell.