The optical holography technique realized by metasurfaces has emerged as a novel approach to projective volumetric display and information encryption display in the form of ultrathin and almost flat optical devices. Compared to the conventional holographic technique with spatial light modulators, the metahologram has numerous advantages such as miniaturization of optical setup, higher image resolution and larger field of visibility for holographic images. Here, a protocol is reported for the fabrication and optical characterization of optical metaholograms that are sensitive to the spin and direction of incident light. The metasurfaces are composed of hydrogenated amorphous silicon (a-Si:H), which has large refractive index and small extinction coefficient in the entire visible range resulting in high transmittance and diffraction efficiency. The device produces different holographic images when the spin or direction of incident light are switched. Therefore, they can encode multiple types of visual information simultaneously. The fabrication protocol consists of film deposition, electron beam writing and subsequent etching. The fabricated device can be characterized using a customized optical setup that consists of a laser, a linear polarizer, a quarter waveplate, a lens and a charge-coupled device (CCD).