Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

Kristina Ashurbekova; Karina Ashurbekova; Iva Saric; Evgenii Modin; Mladen Petravić; Ilmutdin Abdulagatov; Aziz Abdulagatov; Mato Knez

doi:10.1039/d0cc04195e

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V₃D₃) and azasilane

Chem Commun (Camb). 2020 Aug 4;56(62):8778-8781. doi: 10.1039/d0cc04195e.

Authors

Kristina Ashurbekova¹, Karina Ashurbekova², Iva Saric³, Evgenii Modin², Mladen Petravić³, Ilmutdin Abdulagatov¹, Aziz Abdulagatov¹, Mato Knez⁴

Affiliations

¹ Dagestan State University, Makhachkala 36700, Russian Federation. krashurbekova@inbox.ru.
² CIC nanoGUNE, 20018 San Sebastian, Spain. m.knez@nanogune.eu.
³ Department of Physics and Centre for Micro- and Nanosciences and Technologies, University of Rijeka, 51000 Rijeka, Croatia.
⁴ CIC nanoGUNE, 20018 San Sebastian, Spain. m.knez@nanogune.eu and Department of Physics and Centre for Micro- and Nanosciences and Technologies, University of Rijeka, 51000 Rijeka, Croatia and IKERBASQUE, Basque Foundation for Science, 48013 Bilbao, Spain.

PMID: 32618293
DOI: 10.1039/d0cc04195e

Abstract

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane and N-methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studied in situ with a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy.