Removal Mechanism of Oxide Layer on the Surface of Sn-0.4Ti Alloy for Quartz Glass Sealing

Wanli Hao; Fangzi Li; Yongbo Ma; Weiguang Zhang; Liqun Shi

doi:10.3390/ma13112620

Removal Mechanism of Oxide Layer on the Surface of Sn-0.4Ti Alloy for Quartz Glass Sealing

Materials (Basel). 2020 Jun 9;13(11):2620. doi: 10.3390/ma13112620.

Authors

Wanli Hao^{1

2}, Fangzi Li¹, Yongbo Ma¹, Weiguang Zhang¹, Liqun Shi²

Affiliations

¹ Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China.
² Institute of Modern Physics, Fudan University, Shanghai 200433, China.

Abstract

The oxide layer on the surface of Sn-0.4Ti alloy and its removal mechanism were investigated by coalitional analyses, using XPS and TEM technologies. The results show that a compact SnO_1.65 oxide layer of less than 4 nm in thickness exists on the surface of Sn-0.4Ti alloy. A large number of TiO₂ nanoparticles with scale of several to tens of nanometers were grown in Sn-0.4Ti matrix by depleting SnO_1.65 while welding at 800 °C. These nanoparticles were adhered to the interfacial layer between Sn-0.4Ti alloy and quartz glass, which was formed by the reaction of Sn-0.4Ti and SiO₂ after SnO_1.65 removal from the Sn-0.4Ti. This work may promote further works on Sn-Ti design to further improve the welding quality between Sn-Ti alloy and quartz glass, and also provide a feasible research idea to remove the oxide layer on the surfaces of solders.

Keywords: Sn-0.4Ti alloy; oxide layer; quartz glass; removal mechanism.