Considerations for the nano aperture ion source: Geometrical design and electrical control

Jeroen A van Kan; Rudy Pang; Tanmoy Basu; Yanxin Dou; Gokul; Nicolas Tarino; Jack Tregidga; Sangita Chaki Roy; Huei Ming Tan

doi:10.1063/1.5128657

Considerations for the nano aperture ion source: Geometrical design and electrical control

Rev Sci Instrum. 2020 Jan 1;91(1):013310. doi: 10.1063/1.5128657.

Authors

Jeroen A van Kan¹, Rudy Pang¹, Tanmoy Basu¹, Yanxin Dou¹, Gokul², Nicolas Tarino², Jack Tregidga¹, Sangita Chaki Roy¹, Huei Ming Tan²

Affiliations

¹ Centre for Ion Beam Applications, Department of Physics, National University of Singapore, Singapore.
² Engineering Science Programme, National University of Singapore, Singapore.

PMID: 32012538
DOI: 10.1063/1.5128657

Abstract

A new type of ion source is being developed for proton beam writing and other focused ion beam applications. The potential of this source as well as achieved performance of the nano aperture ion source will be evaluated. Based on the ideal source parameters, critical geometrical parameters constraining chromatic aberrations and a possible pathway to achieve this performance will be presented. Finally, an electronic control system to minimize chromatic and spherical aberrations to an acceptable level will be demonstrated.