Direct Synthesis of Graphene Dendrites on SiO2/Si Substrates by Chemical Vapor Deposition

Nanoscale Res Lett. 2020 Jan 17;15(1):16. doi: 10.1186/s11671-020-3245-y.

Abstract

The long-standing interest in graphene has recently brought graphene-derived materials including graphene hydrogel, graphene fiber and graphene paper into sharp focus. These graphene-derived materials show outstanding properties in mechanics and physics. In this paper, for the first time, we demonstrate the novel synthesis of graphene dendrites on SiO2/Si substrates by chemical vapor deposition. The tree-like graphene dendrites with well-controlled morphology can be directly grown on both the Si and the SiO2 surfaces of the substrates by using methane and hydrogen as precursors. The graphene dendrites on SiO2/Si substrates can be directly used in the fabrication of the electronic device. The conductivity and the Hall mobility of graphene dendrites are ~ 286 Scm-1 and ~ 574 cm2(Vs)-1, respectively. Young's modulus of graphene dendrites is up to 2.26 GPa. The developed method avoids the need for a metal substrate and is scalable and compatible with the existing semiconductor technology, making graphene dendrites be very promising in nanoelectronic applications.

Keywords: CVD; Graphene dendrites; Nanoelectronic applications; SiO2/Si substrates.