Incorporation of quantum dots (QDs) into color filters (CFs) are desired for less energy loss and wider viewing angle compared to a conventional display. However, aggregation and vulnerability to heat, moisture, and chemicals in the photo-patternable matrix are critical issues of the QD-CFs with high QDs concentration. Herein, we fabricated red (10 wt %) and green (20 wt %) QD-CFs using photolithography of QD/siloxane ink containing secondary thiol monomer. Ligand-exchanged QDs were chemically incorporated in methacrylate oligosiloxane resin. QD/siloxane composite showed superior stability under harsh heat and moisture (85 °C/5% RH and 85 °C/85% RH) conditions and chemicals (EtOH, HCl, and NaOH) compared to conventional QD/PR (commercial negative photoresist). QD-CFs (10 μm thick) effectively converted blue light emitted from LED chip into red and green light, and the obtained white PL through QD-CF showed wide color gamut, which was 108% relative to NTSC. From these advantages, QD/siloxane composite will be beneficial as color-conversion photoresists are to be used as color filters in liquid crystal displays, micro light-emitting diodes, and organic light-emitting diodes.
Keywords: photo-patternability; quantum dot color filter; siloxane hybrids; sol−gel condensation; thermal and chemical stability.