So far, there have been few studies on the microscopic wetting behavior of aluminum liquid on cathode surfaces, which is critical for developing wettable cathode materials. In the present study, an investigation on the coalescence and wetting mechanism of Al droplets on different carbonaceous substrates has been performed via molecular dynamics (MD) simulation for developing wettable cathodes. The growth rate of liquid bridge, the mean squared displacement, the balanced contact angle, and the time of full coalescence were calculated to describe the coalescence and wetting of the Al droplets. The results illustrate the sequence of full coalescence time for the Al droplets: DG < HCNT < VCNT ≈ AC and the corresponding balanced contact angles were 47.98°, 53.32°, 55.02°, and 63.12°, respectively. Furthermore, the presence of defects on DG will increase the time of coalescence and the contact angle but the directions of defects have little influence. The free energy analysis indicates that the defects reduce the solid-liquid interaction and the work done for removing the Al droplet from the substrates so that the wettability is weaker than that for perfect graphene, which also explains the balanced wettability of Al droplets on the other substrates. In addition, the surface roughness increases the contact angle of Al liquid on AC (from 62° to 113°-120°) and hence, the wettability is changed from good to poor. In general, our results can improve the understanding of the wetting of AC and graphene by Al liquid at the atomic level, which can provide direction and theoretical guidance for further research on wettable cathodes.