Multifunctional antireflective coatings have practical applications as important optical components in many fields, particularly for optical devices and imaging systems. However, a good antireflection application in the visible region is often unsatisfactory for mid-infrared devices, and the difficulty in obtaining multiple capabilities simultaneously is one of the main factors limiting their applications. In this work, hierarchical moth-eye structures with superhydrophobicity were fabricated via inductively coupled plasma reactive ion etching (ICP-RIE) using nanodisk-array masks, which were formed by three-beam laser interference lithography (LIL), for improving the ultra-broadband optical properties. The uniform antireflection efficiency, which was close to 1% reflectivity covering over the visible and mid-infrared wavelength range, was exhibited by the moth-eye structures with high-quality pillar arrays. Additionally, irregular nanostructures were tailored onto the top of the pillars to generate hierarchical moth-eye structures for simultaneously obtaining both the superhydrophobic and anticorrosive properties. The fabricated antireflective structures, with the features of self-cleaning and durability, have the advantage of being for long-term use in harsh environments.