In this work, the shock sensitivity of hexachlorodisilane (HCDS) hydrolysis products was studied. The hydrolysis conditions included vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was determined by using a Fall hammer apparatus. Extensive infrared studies were done for the hydrolysis products. It was found that the Si-Si bond in HCDS during hydrolysis is preserved and can be cleaved by shock, leading to intramolecular oxidation of the neighboring silanol (Si-OH) groups to form a networked Si-O-Si structure and hydrogen gas. The limiting impact energy for shock sensitivity was also found proportional to the oxygen/silicon ratio in the deposit. Finally, recommendations are given for controlling the shock sensitivity of the hydrolyzed deposit.