Development of novel correlative light and electron microscopy linkage system using silicon nitride film

Tomohiro Haruta; Yuta Ikeda; Yuji Konyuba; Tomohisa Fukuda; Hideo Nishioka

doi:10.1093/jmicro/dfy145

Development of novel correlative light and electron microscopy linkage system using silicon nitride film

Microscopy (Oxf). 2019 Apr 1;68(2):189-193. doi: 10.1093/jmicro/dfy145.

Authors

Tomohiro Haruta¹, Yuta Ikeda², Yuji Konyuba², Tomohisa Fukuda², Hideo Nishioka¹

Affiliations

¹ Application Management Department. JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, Japan.
² 22EM business unit, JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, Japan.

PMID: 30608592
DOI: 10.1093/jmicro/dfy145

Abstract

In this study, we investigated the optical properties of a silicon nitride (SiN) film. The thin SiN film (30 nm thick) exhibited good light transmittance and little autofluorescence and could be used as a microscope slide for optical microscopy (OM). In addition, we developed a novel correlative light and electron microscopy (CLEM) that combines OM with transmission electron microscopy (TEM) using an SiN thin film. In this system, CLEM was performed by replacing a detachable retainer with a holder for TEM and an adaptor for OM. The advantage of this method is that the same specimens can be sequentially observed using suitable OM and TEM.

Keywords: OM–TEM integration; SiN film; TEM holder; correlative microscopy; exchangeable retainer.