Self-Templating Approaches to Hollow Nanostructures

Abstract

This current research progress on the fabrication of hollow nanostructures by using self-templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self-templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution-regrowth, and the surface-protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented.

Keywords: Ostwald ripening; dissolution-regrowth; galvanic replacements; hollow nanostructures; self-templating; surface-protected hollowing process; the Kirkendall effect.