Perovskite Nanoparticle Composite Films by Size Exclusion Lithography

Duong Nguyen Minh; Sangwon Eom; Lan Anh Thi Nguyen; Juwon Kim; Jae Hyun Sim; Chunhee Seo; Jihye Nam; Sangheon Lee; Soyeon Suk; Jaeyong Kim; Youngjong Kang

doi:10.1002/adma.201802555

Perovskite Nanoparticle Composite Films by Size Exclusion Lithography

Adv Mater. 2018 Sep;30(39):e1802555. doi: 10.1002/adma.201802555. Epub 2018 Jul 23.

Authors

Affiliations

¹ Department of Chemistry, Hanyang University, 222 Wangsimni-Ro, Seongdong-Gu, Seoul, 04763, Korea.
² Department of Physics, HYU-HPSTAR-CIS High Pressure Research Center, Hanyang University, Seoul, 04763, South Korea.
³ Department of Chemistry, Research Institute for Natural Sciences, Institute of Nano Science and Technology, Hanyang University, 222 Wangsimni-Ro, Seongdong-Gu, Seoul, 04763, Korea.

PMID: 30039549
DOI: 10.1002/adma.201802555

Abstract

Perovskite nanoparticle composite films with capability of high-resolution patterning (≥2 µm) and excellent resistance to various aqueous and organic solvents are prepared by in situ photosynthesis of acrylate polymers and formamidinium lead halide (FAPbX₃ ) nanoparticles. Both positive- and negative-tone patterns of FAPbX₃ nanoparticles are created by controlling the size exclusive flow of nanoparticles in polymer networks. The position of nanoparticles is spatially controlled in both lateral and vertical directions. The composite films show high photoluminescence quantum yield (up to 44%) and broad color tunability in visible region (λ_peak = 465-630 nm).

Keywords: composite; lithography; mass-transfer; perovskite; size exclusion.

Abstract

Grants and funding