A New Anion-Trapping Radical Host, [(Cu-dppe)3 {hat-(CN)6 }]2+

Takashi Okubo; Susumu Kitagawa; Mitsuru Kondo; Hiroyuki Matsuzaka; Tomohiko Ishii

doi:10.1002/(SICI)1521-3773(19990401)38:7<931::AID-ANIE931>3.0.CO;2-B

A New Anion-Trapping Radical Host, [(Cu-dppe)₃ {hat-(CN)₆ }]²⁺

Angew Chem Int Ed Engl. 1999 Apr 1;38(7):931-933. doi: 10.1002/(SICI)1521-3773(19990401)38:7<931::AID-ANIE931>3.0.CO;2-B.

Authors

Takashi Okubo¹, Susumu Kitagawa², Mitsuru Kondo², Hiroyuki Matsuzaka¹, Tomohiko Ishii¹

Affiliations

¹ Department of Chemistry, Graduate School of Science, Tokyo Metropolitan University, Minami-ohsawa Hachioji, Tokyo 192-0397 (Japan).
² Department of Synthetic Chemistry and Biological Chemistry, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501 (Japan), Fax: (+81) 75-753-4979.

PMID: 29711853
DOI: 10.1002/(SICI)1521-3773(19990401)38:7<931::AID-ANIE931>3.0.CO;2-B

Abstract

Anions PF₆^- and CF₃ SO₃^- are trapped by the new radical host [(Cu-dppe)₃ {hat-(CN)₆ }]²⁺ , which was synthesized in a one-pot reaction from a copper(I) source, hat-(CN)₆ , and dppe in acetone. The trapped salts have been characterized both in solution and in the solid state (see picture: A^- : PF₆^- , CF₃ SO₃^- ). hat-(CN)₆ =hexaazatriphenylene hexacarbonitrile; dppe=1,2-bis(diphenylphosphanyl)ethane.

Keywords: Copper; Crystal engineering; Host-guest chemistry; NMR spectroscopy; Radicals.