Role of SiN x Barrier Layer on the Performances of Polyimide Ga₂O₃-doped ZnO p-i-n Hydrogenated Amorphous Silicon Thin Film Solar Cells

Fang-Hsing Wang; Hsin-Hui Kuo; Cheng-Fu Yang; Min-Chu Liu

doi:10.3390/ma7020948

Role of SiN _x Barrier Layer on the Performances of Polyimide Ga₂O₃-doped ZnO p-i-n Hydrogenated Amorphous Silicon Thin Film Solar Cells

Materials (Basel). 2014 Feb 7;7(2):948-962. doi: 10.3390/ma7020948.

Authors

Fang-Hsing Wang¹, Hsin-Hui Kuo², Cheng-Fu Yang³, Min-Chu Liu⁴

Affiliations

¹ Department of Electrical Engineering, and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 40227, Taiwan. fansen@dragon.nchu.edu.tw.
² Department of Electrical Engineering, National University of Kaohsiung, Kaohsiung 81148, Taiwan. hhkuo@nuk.edu.tw.
³ Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 81148, Taiwan. cfyang@nuk.edu.tw.
⁴ Department of Electrical Engineering, and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 40227, Taiwan. stmike18@yahoo.com.tw.

Abstract

In this study, silicon nitride (SiN_x) thin films were deposited on polyimide (PI) substrates as barrier layers by a plasma enhanced chemical vapor deposition (PECVD) system. The gallium-doped zinc oxide (GZO) thin films were deposited on PI and SiN_x/PI substrates at room temperature (RT), 100 and 200 °C by radio frequency (RF) magnetron sputtering. The thicknesses of the GZO and SiN_x thin films were controlled at around 160 ± 12 nm and 150 ± 10 nm, respectively. The optimal deposition parameters for the SiN_x thin films were a working pressure of 800 × 10^-3 Torr, a deposition power of 20 W, a deposition temperature of 200 °C, and gas flowing rates of SiH₄ = 20 sccm and NH₃ = 210 sccm, respectively. For the GZO/PI and GZO-SiN_x/PI structures we had found that the GZO thin films deposited at 100 and 200 °C had higher crystallinity, higher electron mobility, larger carrier concentration, smaller resistivity, and higher optical transmittance ratio. For that, the GZO thin films deposited at 100 and 200 °C on PI and SiN_x/PI substrates with thickness of ~1000 nm were used to fabricate p-i-n hydrogenated amorphous silicon (α-Si) thin film solar cells. 0.5% HCl solution was used to etch the surfaces of the GZO/PI and GZO-SiN_x/PI substrates. Finally, PECVD system was used to deposit α-Si thin film onto the etched surfaces of the GZO/PI and GZO-SiN_x/PI substrates to fabricate α-Si thin film solar cells, and the solar cells' properties were also investigated. We had found that substrates to get the optimally solar cells' efficiency were 200 °C-deposited GZO-SiN_x/PI.

Keywords: GZO thin film; PECVD; polyimide (PI); silicon nitride (SiNx); silicon thin film solar cell.