Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate

Yingying Cong; Dedong Han; Junchen Dong; Shengdong Zhang; Xing Zhang; Yi Wang

doi:10.1038/s41598-017-01691-7

Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate

Sci Rep. 2017 May 4;7(1):1497. doi: 10.1038/s41598-017-01691-7.

Authors

Yingying Cong¹, Dedong Han², Junchen Dong¹, Shengdong Zhang^{1

3}, Xing Zhang¹, Yi Wang¹

Affiliations

¹ Institute of Microelectronics, Peking University, Beijing, 100871, China.
² Institute of Microelectronics, Peking University, Beijing, 100871, China. handedong@pku.edu.cn.
³ Shenzhen Graduate School, Peking University, Shenzhen, 518055, China.

Abstract

In this work, fully transparent high performance double-channel indium-tin-oxide/Al-Sn-Zn-O thin-film transistors (ITO/ATZO TFTs) are successfully fabricated on glass by radio frequency (RF) magnetron sputtering. The ITO layer acts as the bottom channel layer to increase the channel carrier concentration. The top ATZO channel layer, which is deposited via high oxygen partial pressure in the sputtering process, is useful to control the minimum off-state current. After annealing, the ITO/ATZO TFT demonstrates outstanding electrical performances, including a high ON/OFF current ratio (I_on/I_off) of 3.5 × 10⁸, a steep threshold swing (SS) of 142.2 mV/decade, a superior saturation mobility (μ_sat) of 246.0 cm²/Vs, and a threshold voltage V_T of 0.5 V. The operation mechanisms for double-channel structures are also clarified.

Publication types

Research Support, Non-U.S. Gov't