Abatement and toxicity reduction of antimicrobials by UV/H2O2 process

Abstract

Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H₂O₂) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time.

Keywords: Advanced oxidation process; Antimicrobial activity; Ofloxacin; Peroxidation; Photolysis; Sulfaquinoxaline.