Direct-Write Optical Patterning of P3HT Films Beyond the Diffraction Limit

Ian E Jacobs; Erik W Aasen; Derek Nowak; Jun Li; William Morrison; John D Roehling; Matthew P Augustine; Adam J Moulé

doi:10.1002/adma.201603221

Direct-Write Optical Patterning of P3HT Films Beyond the Diffraction Limit

Adv Mater. 2017 Jan;29(2). doi: 10.1002/adma.201603221. Epub 2016 Oct 14.

Authors

Ian E Jacobs¹, Erik W Aasen², Derek Nowak³, Jun Li², William Morrison³, John D Roehling², Matthew P Augustine⁴, Adam J Moulé^{2

4}

Affiliations

¹ Department of Materials Science and Engineering, University of California Davis, One Shields Avenue, Davis, CA, 95616, USA.
² Department of Chemical Engineering, University of California Davis, One Shields Avenue, Davis, CA, 95616, USA.
³ Molecular Vista, Inc, 6840 Via Del Oro, Suite 110, San Jose, CA, 95119, USA.
⁴ Department of Chemistry, University of California Davis, One Shields Avenue, Davis, CA, 95616, USA.

PMID: 27740691
DOI: 10.1002/adma.201603221

Abstract

Doping-induced solubility control is a patterning technique for semiconducting polymers, which utilizes the reduction in polymer solubility upon p-type doping to provide direct, optical control of film topography and doping level. In situ direct-write patterning and imaging are demonstrated, revealing sub-diffraction-limited topographic features. Photoinduced force microscopy shows that doping level can be optically modulated with similar resolution.

Keywords: doping; lithography; organic electronics; patterning; polymers.