Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

Hwan-Jin Jeon; Ju Young Kim; Woo-Bin Jung; Hyeon-Su Jeong; Yun Ho Kim; Dong Ok Shin; Seong-Jun Jeong; Jonghwa Shin; Sang Ouk Kim; Hee-Tae Jung

doi:10.1002/adma.201602523

Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

Adv Mater. 2016 Oct;28(38):8439-8445. doi: 10.1002/adma.201602523. Epub 2016 Aug 4.

Authors

Hwan-Jin Jeon^{1

2}, Ju Young Kim^{3

4}, Woo-Bin Jung⁵, Hyeon-Su Jeong⁶, Yun Ho Kim⁷, Dong Ok Shin⁴, Seong-Jun Jeong³, Jonghwa Shin⁸, Sang Ouk Kim⁹, Hee-Tae Jung¹⁰

Affiliations

¹ National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
² Department of Nano-structured Materials Research, Korea National Nanofab Center, Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
³ National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
⁴ Power Control Device Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700, Republic of Korea.
⁵ National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
⁶ Soft Innovative Materials Research Center, Korea Institute of Science and Technology (KIST), Wanju-gun, Jeollabuk-do, 565-905, Republic of Korea.
⁷ Advanced Functional Materials Research Group, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-600, Republic of Korea.
⁸ Advanced Photonic Materials and Devices Laboratory, Department of National Research Laboratory, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. qubit@kaist.ac.kr.
⁹ National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. sangouk.kim@kaist.ac.kr.
¹⁰ National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. heetae@kaist.ac.kr.

PMID: 27488974
DOI: 10.1002/adma.201602523

Abstract

High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.

Keywords: block copolymers; high aspect ratio; high resolution; plasma reaction; secondary sputtering.