Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

Marco A Squillaci; Feng Qiu; Alessandro Aliprandi; Fan Zhang; Xinliang Feng; Paolo Samorì

doi:10.1002/adma.201600329

Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

Adv Mater. 2016 Jul;28(26):5249-54. doi: 10.1002/adma.201600329. Epub 2016 May 6.

Authors

Marco A Squillaci¹, Feng Qiu², Alessandro Aliprandi¹, Fan Zhang², Xinliang Feng^{2

3}, Paolo Samorì¹

Affiliations

¹ ISIS & icFRC, University of Strasbourg & CNRS, 8 Allée Gaspard Monge, 67000, Strasbourg, France.
² School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, P. R. China.
³ Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry, Technische Universität Dresden, Mommsenstraße 4, 01062, Dresden, Germany.

PMID: 27153351
DOI: 10.1002/adma.201600329

Abstract

A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.

Keywords: boron-cored chromophores; fluorous materials; organic electronics; patterning; photoresists.