Athermal Azobenzene-Based Nanoimprint Lithography

Christian Probst; Christoph Meichner; Klaus Kreger; Lothar Kador; Christian Neuber; Hans-Werner Schmidt

doi:10.1002/adma.201505552

Athermal Azobenzene-Based Nanoimprint Lithography

Adv Mater. 2016 Apr 6;28(13):2624-8. doi: 10.1002/adma.201505552. Epub 2016 Jan 28.

Authors

Christian Probst¹, Christoph Meichner², Klaus Kreger¹, Lothar Kador², Christian Neuber¹, Hans-Werner Schmidt¹

Affiliations

¹ Macromolecular Chemistry I and Bayreuth, Institute of Macromolecular Research, University of Bayreuth, D-95440, Bayreuth, Germany.
² Institute of Physics and Bayreuth Institute of Macromolecular Research, University of Bayreuth, D-95440, Bayreuth, Germany.

PMID: 26822954
DOI: 10.1002/adma.201505552

Abstract

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated.

Keywords: athermal photofluidization; azobenzene; nanoimprint lithography; nanopatterning; soft lithography.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Azo Compounds / chemistry*
Dimethylpolysiloxanes / chemistry
Isomerism
Microscopy, Atomic Force
Microscopy, Electron, Scanning
Nanostructures / chemistry
Nanotechnology*
Ultraviolet Rays

Substances

Azo Compounds
Dimethylpolysiloxanes
azobenzene