Multimode interference reflectors (MIRs) were recently introduced as a new type of photonic integrated devices for on-chip, broadband light reflection. In the original proposal, different MIRs were demonstrated based on total internal reflection mirrors made of two deep-etched facets. Although simpler to fabricate, this approach imposes certain limits on the shape of the field pattern at the reflecting facets, which in turn restricts the types of MIRs that can be implemented. In this work, we propose and experimentally demonstrate the use of aluminium-based mirrors for the design of 2-port MIRs with variable reflectivity. These mirrors do not impose any restrictions on the incident field, and thus give more flexibility at the design stage. Devices with different reflectivities in the range between 0 and 0.5 were fabricated in a 3 um thick SOI platform, and characterization of multiple dies was performed to extract statistical data about their performance. Our measurements show that, on average, losses both in the aluminium mirror and in the access waveguides reduce the reflectivities to about 79% of their target value. Moreover, standard deviations lower than ±5% are obtained over a 20 nm wavelength range (1540-1560 nm). We also provide a theoretical model of the aluminium mirror based on the effective index method and Fresnel equations in multilayer thin films, which shows good agreement with FDTD simulations.