Transition from compact to porous films in deposition with temperature-activated diffusion

Phys Rev E Stat Nonlin Soft Matter Phys. 2015 Jul;92(1):012402. doi: 10.1103/PhysRevE.92.012402. Epub 2015 Jul 6.

Abstract

We study a thin-film growth model with temperature activated diffusion of adsorbed particles, allowing for the formation of overhangs and pores, but without detachment of adatoms or clusters from the deposit. Simulations in one-dimensional substrates are performed for several values of the diffusion-to-deposition ratio R of adatoms with a single bond and of the detachment probability ε per additional nearest neighbor, respectively, with activation energies are E(s) and E(b). If R and ε independently vary, regimes of low and high porosity are separated at 0.075≤ε(c)≤0.09, with vanishingly small porosity below that point and finite porosity for larger ε. Alternatively, for fixed values of E(s) and E(b) and varying temperature, the porosity has a minimum at T(c), and a nontrivial regime in which it increases with temperature is observed above that point. This is related to the large mobility of adatoms, resembling features of equilibrium surface roughening. In this high-temperature region, the deposit has the structure of a critical percolation cluster due to the nondesorption. The pores are regions enclosed by blobs of the corresponding percolating backbone, thus the distribution of pore size s is expected to scale as s(-τ̃) with τ̃≈1.45, in reasonable agreement with numerical estimates. Roughening of the outer interface of the deposits suggests Villain-Lai-Das Sarma scaling below the transition. Above the transition, the roughness exponent α≈0.35 is consistent with the percolation backbone structure via the relation α=2-d(B), where d(B) is the backbone fractal dimension.