Digital holographic microscopy is an important interferometric tool in optical metrology allowing the investigation of engineered surfaces with microscale lateral resolution and nanoscale axial precision. In particular, microelectromechanical systems (MEMS) surface analysis, conducted by holographic characterization, requires high accuracy for functional testing. The main issues related to MEMS inspection are the superficial roughness and the complex geometry resulting from the several fabrication steps. Here, an automatic procedure, particularly suited in the case of high-roughness surfaces, is presented to selectively filter the spectrum, providing very low-noise reconstructed images. The numerical procedure is based on Butterworth filtering, and the obtained results demonstrate a significant increase in the images' quality and in the accuracy of the measurements, making our technique highly applicable for quantitative phase imaging in MEMS analysis. Furthermore, our method is fully tunable to the spectrum under investigation and automatic. This makes it highly suitable for real-time applications. Several experimental tests show the suitability of the proposed approach.