Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Jian Liu; Hongqiang Wang; Zu Peng Chen; Helmuth Moehwald; Sebastian Fiechter; Roel van de Krol; Liping Wen; Lei Jiang; Markus Antonietti

doi:10.1002/adma.201404543

Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Adv Mater. 2015 Jan 27;27(4):712-8. doi: 10.1002/adma.201404543. Epub 2014 Dec 10.

Authors

Jian Liu¹, Hongqiang Wang, Zu Peng Chen, Helmuth Moehwald, Sebastian Fiechter, Roel van de Krol, Liping Wen, Lei Jiang, Markus Antonietti

Affiliation

¹ Max Planck Institute of Colloids and Interfaces, Research Campus Golm, Potsdam, 14424, Germany.

PMID: 25492578
DOI: 10.1002/adma.201404543

Abstract

An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ "chemical vapor deposition". A photocurrent density of 30.2 μA cm(-2 --) at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices.

Keywords: anodic aluminum oxide; graphitic carbon nitride film; microcontact printing; pattern; photoelectrochemical.