Refractory plasmonics with titanium nitride: broadband metamaterial absorber

Wei Li; Urcan Guler; Nathaniel Kinsey; Gururaj V Naik; Alexandra Boltasseva; Jianguo Guan; Vladimir M Shalaev; Alexander V Kildishev

doi:10.1002/adma.201401874

Refractory plasmonics with titanium nitride: broadband metamaterial absorber

Adv Mater. 2014 Dec 17;26(47):7959-65. doi: 10.1002/adma.201401874. Epub 2014 Oct 18.

Authors

Wei Li¹, Urcan Guler, Nathaniel Kinsey, Gururaj V Naik, Alexandra Boltasseva, Jianguo Guan, Vladimir M Shalaev, Alexander V Kildishev

Affiliation

¹ School of Electrical & Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA; State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan, 430070, China.

PMID: 25327161
DOI: 10.1002/adma.201401874

Abstract

A high-temperature stable broadband plasmonic absorber is designed, fabricated, and optically characterized. A broadband absorber with an average high absorption of 95% and a total thickness of 240 nm is fabricated, using a refractory plasmonic material, titanium nitride. This absorber integrates both the plasmonic resonances and the dielectric-like loss. It opens a path for the interesting applications such as solar thermophotovoltaics and optical circuits.

Keywords: high temperature; nanostructures; perfect absorbers; plasmonic metamaterials; solar thermophotovoltaics.