Controlling the Er content of porous silicon using the doping current intensity

Nanoscale Res Lett. 2014 Jul 4;9(1):332. doi: 10.1186/1556-276X-9-332. eCollection 2014.

Abstract

The results of an investigation on the Er doping of porous silicon are presented. Electrochemical impedance spectroscopy, optical reflectivity, and spatially resolved energy dispersive spectroscopy (EDS) coupled to scanning electron microscopy measurements were used to investigate on the transient during the first stages of constant current Er doping. Depending on the applied current intensity, the voltage transient displays two very different behaviors, signature of two different chemical processes. The measurements show that, for equal transferred charge and identical porous silicon (PSi) layers, the applied current intensity also influences the final Er content. An interpretative model is proposed in order to describe the two distinct chemical processes. The results can be useful for a better control over the doping process.

Pacs: 81.05.Rm; 82.45.Rr.

Keywords: Electrochemical impedance spectroscopy; Er doping; Porous Silicon; Reflectivity; Scanning electron microscopy.