New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams

Yushi Kato; Yosuke Kurisu; Dai Nozaki; Keisuke Yano; Daiju Kimura; Sho Kumakura; Youta Imai; Takuya Nishiokada; Fuminobu Sato; Toshiyuki Iida

doi:10.1063/1.4857975

New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams

Rev Sci Instrum. 2014 Feb;85(2):02A950. doi: 10.1063/1.4857975.

Authors

Affiliation

¹ Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.

PMID: 24593529
DOI: 10.1063/1.4857975

Abstract

A new tandem type source has been constructed on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams based on ECR ion source (ECRIS). It is considered that ECR plasmas are necessary to be available to individual operations with different plasma parameters. Both of analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas. We describe construction of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source.