Seeding molecular rotators on a passivated silicon surface

Oliver Guillermet; Ather Mahmood; Jianshu Yang; Jorge Echeverria; Judicael Jeannoutot; Sebastien Gauthier; Christian Joachim; Frederic Chérioux; Frank Palmino

doi:10.1002/cphc.201301015

Seeding molecular rotators on a passivated silicon surface

Chemphyschem. 2014 Feb 3;15(2):271-5. doi: 10.1002/cphc.201301015.

Authors

Oliver Guillermet¹, Ather Mahmood, Jianshu Yang, Jorge Echeverria, Judicael Jeannoutot, Sebastien Gauthier, Christian Joachim, Frederic Chérioux, Frank Palmino

Affiliation

¹ GNS & MANA Satellite, CEMES (Centre d'Elaboration de Matériaux et d'Etudes Structurales), CNRS, 29 rue Jeanne Marvig, BP 94347, 31055 Toulouse (France); Université de Toulouse, CEMES (Centre d'Elaboration de Matériaux et d'Etudes Structurales), CNRS, 29 rue Jeanne Marvig, BP 94347, 31055 Toulouse (France).

PMID: 24470163
DOI: 10.1002/cphc.201301015

Abstract

Thermally activated rotation of single molecules adsorbed on a silicon-based surface between 77 and 150 K has been successfully achieved. This remarkable phenomenon relies on a nanoporous supramolecular network, which acts as a template to seed periodic molecule rotors on the surface. Thermal activation of rotation has been demonstrated by STM experiments and confirmed by theoretical calculations.

Keywords: molecular rotator; scanning probe microscopy; silicon surface; simulation; supramolecular chemistry.