High temperature oxidation of ZrO2/Al2O3 thin films deposited on steel

J Nanosci Nanotechnol. 2013 Nov;13(11):7561-7. doi: 10.1166/jnn.2013.7901.

Abstract

Thin ZrO2/Al2O3 films that consisted of alternating monoclinic ZrO2 nanolayers and amorphous Al2O3 nanolayers were deposited on a tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system, and then oxidized at 600-900 degrees C in air for up to 50 h. The ZrO2/Al2O3 films effectively suppressed the oxidation of the substrate up to 800 degrees C by acting as a barrier layer against the outward diffusion of the substrate elements and inward diffusion of oxygen. However, rapid oxidation occurred at 900 degrees C due mainly to the increased diffusion and subsequent oxidation of steel as well as the crystallization of amorphous Al2O3.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Adsorption
  • Aluminum / chemistry*
  • Crystallization / methods
  • Heating / methods
  • Macromolecular Substances / chemistry
  • Materials Testing
  • Membranes, Artificial*
  • Metal Nanoparticles / chemistry*
  • Metal Nanoparticles / ultrastructure*
  • Molecular Conformation
  • Oxidation-Reduction
  • Particle Size
  • Plasma Gases / chemistry*
  • Steel / chemistry*
  • Surface Properties
  • Zirconium / chemistry*

Substances

  • Macromolecular Substances
  • Membranes, Artificial
  • Plasma Gases
  • Steel
  • Zirconium
  • Aluminum
  • zirconium oxide