Annular fast electron transport in silicon arising from low-temperature resistivity

Phys Rev Lett. 2013 Aug 30;111(9):095001. doi: 10.1103/PhysRevLett.111.095001. Epub 2013 Aug 28.

Abstract

Fast electron transport in Si, driven by ultraintense laser pulses, is investigated experimentally and via 3D hybrid particle-in-cell simulations. A transition from a Gaussian-like to an annular fast electron beam profile is demonstrated and explained by resistively generated magnetic fields. The results highlight the potential to completely transform the beam transport pattern by tailoring the resistivity-temperature profile at temperatures as low as a few eV.