A novel planarization method based on photoinduced confined chemical etching

Chem Commun (Camb). 2013 Jul 21;49(57):6451-3. doi: 10.1039/c3cc42368a.

Abstract

A photoinduced confined chemical etching system based on TiO2 nanotube arrays is developed for the planarization of the copper surface, which is proved to be a prospective stress-free chemical planarization method for metals and semiconductors.