We present a new synchrotron X-ray photoelectron spectroscopy strategy for surface chemical analysis of materials. Our approach is based on the acquisition of photoelectron spectra at constant kinetic energies with the help of a tunable synchrotron X-radiation source. This ensures both constant and tunable information depth for all elements in a very thin organic layer. Many of the problems known to XPS depth profiling using laboratory equipment are thereby avoided. Using our methodology, the 95% information depth, z(95%), can be tuned down to about 0.7 nm in organic materials. The upper limit in our study at the HE-SGM monochromator dipole magnet beamline at the synchrotron radiation source BESSY II is about 4.3 nm. Elemental quantification is achieved through relative sensitivity factors (RSF) specific to the measurement conditions, determined either with the help of calculated photoionization cross sections and inelastic mean free paths or experimentally. The potential of the technique is demonstrated for the in-depth analysis of plasma deposited nitrogen-rich organic thin films used in biomedical applications.