Enhanced lithographic imaging layer meets semiconductor manufacturing specification a decade early

Adv Mater. 2012 May 15;24(19):2608-13. doi: 10.1002/adma.201104871. Epub 2012 Apr 10.
No abstract available

Publication types

  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Aluminum Oxide / chemistry
  • Polymethyl Methacrylate / chemistry
  • Semiconductors*
  • Silicon Dioxide / chemistry

Substances

  • Silicon Dioxide
  • Polymethyl Methacrylate
  • Aluminum Oxide