Copper(I) N,N'-diisopropylacetamidinate [Cu(amd)]2 (amd = CH(CH3)2NC(CH3)NCH(CH3)2), an oxygen and halogen-free compound, was previously tested as precursor for pure copper CVD and ALD films. The present work deals with the investigation of the composition and of the reactivity of the gas phase during the CVD process. The work was performed by mass spectrometry as a function of temperature in two different, though complementary environments: (A) in a miniature, low pressure hot wall CVD reactor, (B) in a cold wall reactor operating at subatmospheric pressure. (A) revealed that the onset of thermal decomposition is 140 degrees C and 130 degrees C in vacuum and in the presence of hydrogen, respectively; maximal decomposition degree is reached at temperature higher than 200 degrees C. The protonated ligand H(amd) is the main gaseous decomposition by-product; propene CH2=CHCH3, acetonitryle CH3C[triple bond]N and iminopropane CH3C(CH3)=NH are also observed in vacuum. Heterogeneous decomposition mechanism both in vacuum and hydrogen presence is discussed.