From mesoscopic to nanoscopic surface structures: lithography with colloid monolayers
Adv Mater
.
1998 Apr;10(6):495-7.
doi: 10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-A.
Authors
F Burmeister
1
,
C Schäfle
,
B Keilhofer
,
C Bechinger
,
J Boneberg
,
P Leiderer
Affiliation
1
Department of Physics, University of Konstanz, Postfach 5560 M676, D-78434 Konstanz (Germany).
PMID:
21647987
DOI:
10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-A
No abstract available