Cobalt and Nickel Nanopillars on Aluminium Substrates by Direct Current Electrodeposition Process

A Santos; L Vojkuvka; J Pallarés; J Ferré-Borrull; L F Marsal

doi:10.1007/s11671-009-9351-5

Cobalt and Nickel Nanopillars on Aluminium Substrates by Direct Current Electrodeposition Process

Nanoscale Res Lett. 2009 May 31;4(9):1021-1028. doi: 10.1007/s11671-009-9351-5.

Authors

A Santos¹, L Vojkuvka, J Pallarés, J Ferré-Borrull, L F Marsal

Affiliation

¹ Departament d'Enginyeria Electrònica, Elèctrica i Automàtica, Universitat Rovira i Virgili, Avda. Països Catalans 26, 43007 Tarragona, Spain.

Abstract

A fast and cost-effective technique is applied for fabricating cobalt and nickel nanopillars on aluminium substrates. By applying an electrochemical process, the aluminium oxide barrier layer is removed from the pore bottom tips of nanoporous anodic alumina templates. So, cobalt and nickel nanopillars are fabricated into these templates by DC electrodeposition. The resulting nanostructure remains on the aluminium substrate. In this way, this method could be used to fabricate a wide range of nanostructures which could be integrated in new nanodevices.