Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology

Nanotechnology. 2010 Feb 26;21(8):85302. doi: 10.1088/0957-4484/21/8/085302. Epub 2010 Jan 25.

Abstract

Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly--organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.

Publication types

  • Research Support, Non-U.S. Gov't