Fabrication of non reflective structure on glassy carbon surface using oxygen ion beam irradiation

Jun Taniguchi; Yoshimi Nemoto; Yoshinari Sugiyama

doi:10.1166/jnn.2009.j039

Fabrication of non reflective structure on glassy carbon surface using oxygen ion beam irradiation

J Nanosci Nanotechnol. 2009 Jan;9(1):445-9. doi: 10.1166/jnn.2009.j039.

Authors

Jun Taniguchi¹, Yoshimi Nemoto, Yoshinari Sugiyama

Affiliation

¹ Department of Applied Electronics, Tokyo University of Science, 2461 Yamazaki, Noda, Chiba, 278-8510, Japan.

PMID: 19441332
DOI: 10.1166/jnn.2009.j039

Abstract

Oxygen ion beam irradiation of glassy carbon (GC) surface is used to fabricate anti-reflection (AR) structures. Ion beam energy of 500 eV has been used to fabricate the finest pitch of AR structures in an irradiation time of 24 min or more. It has been used to fabricate conical AR structures of more than 250 nm in height, and has non-reflective (less than 0.1% reflection) property over the range of visible light. Furthermore, with this method, oblique incident angle reflection has been suppressed. This method is very simple. However, fabrication of AR structures with high throughput is needed, that is now considered achievable.