Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

Nanotechnology. 2009 Mar 11;20(10):105304. doi: 10.1088/0957-4484/20/10/105304. Epub 2009 Feb 16.

Abstract

Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film-particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Anisotropy
  • Cobalt / chemistry*
  • Crystallization / methods*
  • Macromolecular Substances / chemistry
  • Magnetics
  • Materials Testing
  • Membranes, Artificial*
  • Molecular Conformation
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods*
  • Particle Size
  • Platinum / chemistry*
  • Surface Properties

Substances

  • Macromolecular Substances
  • Membranes, Artificial
  • Cobalt
  • Platinum