This paper describes the fabrication of arrays of parallel, electrically addressable metallic nanowires by depositing alternating layers of thin films of metal and polymer-both planar and topographically patterned-and sectioning the laminated structures with an ultramicrotome (nanoskiving). The structures that resulted from this process had two distinct regions: one in which parallel Au nanowires were separated by a minimum distance of 30 nm, and one in which the nanowires diverged such that the distal ends were individually addressable by low-resolution (> or =10 microm) photolithography. Conductive polyaniline (PANI) was electrochemically deposited across the nanowire electrodes to demonstrate their electrical addressability, continuity, and physical separation. Before deposition, the wires were electrically isolated; with the PANI, they were electrically connected. After dry etching to remove the polymer, the gap between the nanowire electrodes returned to an insulating state. This procedure provides a method for making wires with dimensions and separations of <50 nm without the use of e-beam or focused-ion-beam "writing" and opens applications in organic and molecular electronics, chemical and biological sensing, and other fields where nanoscale distances between parallel conductive electrodes are desirable.