The adsorption and photochemical reaction of naphthalene vapor at the air-water interface of water films (22 microm and 450 microm) were studied in a horizontal flow reactor. Experiments were conducted in the regime where gas-phase mass transfer resistance did not limit the uptake. The equilibrium uptake was dependent on water film thickness only below 1 microm. Bulk water-air and air-to-interface partition constants were estimated from the experiments. The equilibrium partition constant between the water film and air decreased with increasing temperature. Photochemical reaction products were isolated in the water film after exposure to UV light. Four main oxygenated products were identified (1,3-indandione, 1(3H)-isobenzofuranone (phthalide), 2H-1-benzopyran-2-one (coumarin), and 1-naphthol). The initial rates of product formation were 46 to 154% larger for the thin film (22 microm) compared to both a thick film (450 microm) and bulk aqueous phase photooxidation. The atmospheric implications of reactions in water films are discussed.