Versatile fabrication of distorted cubic mesoporous silica film using CTAB together with a hydrophobic organic additive

Sajo P Naik; Toshiyuki Yokoi; Wei Fan; Yukichi Sasaki; Ta-chen Wei; Hugh W Hillhouse; Tatsuya Okubo

doi:10.1021/jp060869p

Versatile fabrication of distorted cubic mesoporous silica film using CTAB together with a hydrophobic organic additive

J Phys Chem B. 2006 May 25;110(20):9751-4. doi: 10.1021/jp060869p.

Authors

Sajo P Naik¹, Toshiyuki Yokoi, Wei Fan, Yukichi Sasaki, Ta-chen Wei, Hugh W Hillhouse, Tatsuya Okubo

Affiliation

¹ Department of Chemical System Engineering, The University of Tokyo, PRESTO, JST, Bunkyo-ku, Japan.

PMID: 16706420
DOI: 10.1021/jp060869p

Abstract

We have succeeded in the fabrication of distorted cubic R-3m mesoporous silica film with 3D open mesostructure providing high pore accessibility from the surface-air interface of the film. The film fabrication involves a unique approach of adding 1,3,5- triisopropylbenzene (TIPB) to the silica/cetyltrimethylammoniumbromide (CTAB) coating sol during its preparation. The addition of TIPB induces the formation of spheroid micelles, promoting R-3m mesostructure in the film. This phase does not exist in the corresponding binary phase diagram of CTAB surfactant.