Nanoindentation-induced defects on ultrathin (h = 17 nm) polystyrene (PS) films that are spin cast on silicon (Si) substrates, with residual depths of penetration lower than the film thickness (<17 nm), can either grow to initiate dewetting or level, which results in a flat polymer surface, upon heating above the glass-transition temperature (T(g)). The excess surface energy (DeltaF(gamma)) of the system, which is added to the initially flat coating with the formation of an indent, provides a critical value, DeltaF(gamma,crit) = 6.1 x 10(-16) J, which determines indent evolution upon annealing. An indent grows when DeltaF(gamma) > DeltaF(gamma,crit) and levels when DeltaF(gamma) < DeltaF(gamma,crit). This conclusion is in agreement with previous reports, which used DeltaF(gamma) to distinguish the two (dewetting/leveling) opposing processes (1) in the case of indents deeper than the film thickness and (2) in the case of built-in ordered surface disturbances by capillary force lithography.